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Watermark formation on bare silicon: Impact of illumination and substrate doping

dc.contributor.authorTamaddon, Amir-Hossein
dc.contributor.authorPhilipsen, Harold
dc.contributor.authorMertens, Paul
dc.contributor.authorHolsteyns, Frank
dc.contributor.authorHeyns, Marc
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorvan Dorp, Dennis
dc.date.accessioned2021-10-22T06:22:45Z
dc.date.available2021-10-22T06:22:45Z
dc.date.issued2014
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/24592
dc.sourceIIOimport
dc.titleWatermark formation on bare silicon: Impact of illumination and substrate doping
dc.typeProceedings paper
dc.contributor.imecauthorTamaddon, Amir-Hossein
dc.contributor.imecauthorPhilipsen, Harold
dc.contributor.imecauthorMertens, Paul
dc.contributor.imecauthorHolsteyns, Frank
dc.contributor.imecauthorHeyns, Marc
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorvan Dorp, Dennis
dc.contributor.orcidimecTamaddon, Amir-Hossein::0000-0003-4566-0697
dc.contributor.orcidimecPhilipsen, Harold::0000-0002-5029-1104
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.contributor.orcidimecvan Dorp, Dennis::0000-0002-1085-4232
dc.source.peerreviewyes
dc.source.beginpage89
dc.source.endpage92
dc.source.conferenceUltra Clean Processing of Semiconductor Surfaces XII - UCPSS
dc.source.conferencedate21/09/2014
dc.source.conferencelocationBrussels Belgium
dc.identifier.urlhttp://www.scientific.net/SSP.219.89
imec.availabilityPublished - imec
imec.internalnotesSolid State Phenomena; Vol. 216


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