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TiN/TaN selective etch in replacement metal gate with chlorine based plasmas

dc.contributor.authorTao, Zheng
dc.contributor.authorParaschiv, Vasile
dc.contributor.authorDekkers, Harold
dc.contributor.authorDangol, Anish
dc.contributor.authorsoon aik, chew
dc.date.accessioned2021-10-22T06:26:22Z
dc.date.available2021-10-22T06:26:22Z
dc.date.issued2014
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/24599
dc.sourceIIOimport
dc.titleTiN/TaN selective etch in replacement metal gate with chlorine based plasmas
dc.typeMeeting abstract
dc.contributor.imecauthorTao, Zheng
dc.contributor.imecauthorParaschiv, Vasile
dc.contributor.imecauthorDekkers, Harold
dc.contributor.imecauthorDangol, Anish
dc.contributor.orcidimecDekkers, Harold::0000-0003-4778-5709
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.conferencePlasma Etch and Strip in Microtechnology - PESM
dc.source.conferencedate12/05/2014
dc.source.conferencelocationGrenoble France
imec.availabilityPublished - open access


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