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N10 SADP bulk FinFET depth micro loading improvement with bias pulsing plasma

dc.contributor.authorTao, Zheng
dc.contributor.authorVos, Ingrid
dc.contributor.authorAltamirano Sanchez, Efrain
dc.contributor.authorXu, Kaidong
dc.contributor.authorHellin, David
dc.contributor.authorCamerotto, Elisabeth
dc.contributor.authorJumel, Helene
dc.contributor.authorTitus, Monica
dc.date.accessioned2021-10-22T06:26:52Z
dc.date.available2021-10-22T06:26:52Z
dc.date.issued2014
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/24600
dc.sourceIIOimport
dc.titleN10 SADP bulk FinFET depth micro loading improvement with bias pulsing plasma
dc.typeMeeting abstract
dc.contributor.imecauthorTao, Zheng
dc.contributor.imecauthorVos, Ingrid
dc.contributor.imecauthorAltamirano Sanchez, Efrain
dc.contributor.imecauthorHellin, David
dc.contributor.imecauthorCamerotto, Elisabeth
dc.source.peerreviewno
dc.source.beginpageP14
dc.source.conferencePlasma Etch and Strip in Microtechnology - PESM
dc.source.conferencedate12/05/2014
dc.source.conferencelocationGrenoble France
imec.availabilityPublished - imec


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