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Ozonated DI-water for clean chemical oxide growth

dc.contributor.authorCornelissen, Ingrid
dc.contributor.authorMeuris, Marc
dc.contributor.authorWolke, K.
dc.contributor.authorWilkol, M.
dc.contributor.authorLoewenstein, Lee
dc.contributor.authorDoumen, Geert
dc.contributor.authorHeyns, Marc
dc.date.accessioned2021-09-30T11:36:42Z
dc.date.available2021-09-30T11:36:42Z
dc.date.issued1998
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/2463
dc.sourceIIOimport
dc.titleOzonated DI-water for clean chemical oxide growth
dc.typeOral presentation
dc.contributor.imecauthorCornelissen, Ingrid
dc.contributor.imecauthorMeuris, Marc
dc.contributor.imecauthorDoumen, Geert
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecMeuris, Marc::0000-0002-9580-6810
dc.source.peerreviewno
dc.source.conference4th International Symposium on Ultra Clean Processing of Silicon Surfaces - UCPSS
dc.source.conferencedate21/09/1998
dc.source.conferencelocationOostende Belgium
imec.availabilityPublished - imec
imec.internalnotesPubl. in 1999; Zie C3282


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