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HF etching mechanisms of advanced low-k films

dc.contributor.authorVerdonck, Patrick
dc.contributor.authorLe, Quoc Toan
dc.contributor.authorKrishtab, Mikhail
dc.contributor.authorVanstreels, Kris
dc.contributor.authorArmini, Silvia
dc.contributor.authorSimone, A.
dc.contributor.authorNguyen, Mai Phuong
dc.contributor.authorVan Elshocht, Sven
dc.contributor.authorBaklanov, Mikhaïl
dc.date.accessioned2021-10-22T07:47:13Z
dc.date.available2021-10-22T07:47:13Z
dc.date.issued2014
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/24762
dc.sourceIIOimport
dc.titleHF etching mechanisms of advanced low-k films
dc.typeProceedings paper
dc.contributor.imecauthorVerdonck, Patrick
dc.contributor.imecauthorLe, Quoc Toan
dc.contributor.imecauthorKrishtab, Mikhail
dc.contributor.imecauthorVanstreels, Kris
dc.contributor.imecauthorArmini, Silvia
dc.contributor.imecauthorVan Elshocht, Sven
dc.contributor.orcidimecVerdonck, Patrick::0000-0003-2454-0602
dc.contributor.orcidimecLe, Quoc Toan::0000-0002-0206-6279
dc.contributor.orcidimecVanstreels, Kris::0000-0002-4420-0966
dc.contributor.orcidimecArmini, Silvia::0000-0003-0578-3422
dc.contributor.orcidimecVan Elshocht, Sven::0000-0002-6512-1909
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage155
dc.source.endpage158
dc.source.conferenceIEEE International Interconnect Technology Conference / Advanced Metallization Conference - IITC/AMC
dc.source.conferencedate20/05/2014
dc.source.conferencelocationSan Jose, CA USA
dc.identifier.urlhttp://ieeexplore.ieee.org/xpls/abs_all.jsp?arnumber=6831851&tag=1
imec.availabilityPublished - open access


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