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Evaluating SiGe-on-Si epitaxial quality by inline surface light scattering: a case study on the impact of interfacial oxygen

dc.contributor.authorWostyn, Kurt
dc.contributor.authorKenis, Karine
dc.contributor.authorRondas, Dirk
dc.contributor.authorLoo, Roger
dc.contributor.authorHikavyy, Andriy
dc.contributor.authorDouhard, Bastien
dc.contributor.authorMertens, Paul
dc.contributor.authorHolsteyns, Frank
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorSimpson, Gavin
dc.contributor.authorBast, Gerhard
dc.contributor.authorSwaminathan, Karthik
dc.date.accessioned2021-10-22T08:26:26Z
dc.date.available2021-10-22T08:26:26Z
dc.date.issued2014
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/24834
dc.sourceIIOimport
dc.titleEvaluating SiGe-on-Si epitaxial quality by inline surface light scattering: a case study on the impact of interfacial oxygen
dc.typeProceedings paper
dc.contributor.imecauthorWostyn, Kurt
dc.contributor.imecauthorKenis, Karine
dc.contributor.imecauthorRondas, Dirk
dc.contributor.imecauthorLoo, Roger
dc.contributor.imecauthorHikavyy, Andriy
dc.contributor.imecauthorDouhard, Bastien
dc.contributor.imecauthorMertens, Paul
dc.contributor.imecauthorHolsteyns, Frank
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorSimpson, Gavin
dc.contributor.imecauthorBast, Gerhard
dc.contributor.orcidimecWostyn, Kurt::0000-0003-3995-0292
dc.contributor.orcidimecLoo, Roger::0000-0003-3513-6058
dc.contributor.orcidimecHikavyy, Andriy::0000-0002-8201-075X
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage989
dc.source.endpage995
dc.source.conferenceSiGe, Ge, and Related Compounds 6: Materials, Processing, and Devices
dc.source.conferencedate5/10/2014
dc.source.conferencelocationCancun Mexico
dc.identifier.urlhttp://ecst.ecsdl.org/content/64/6/989.short?related-urls=yes&legid=ecst;64/6/989
imec.availabilityPublished - open access
imec.internalnotesECS Transactions; Vol. 64, Iss. 6


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