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Lateral versus vertical gate-all-around FETs for beyond 7nm technologies

dc.contributor.authorYakimets, Dmitry
dc.contributor.authorHuynh Bao, Trong
dc.contributor.authorGarcia Bardon, Marie
dc.contributor.authorDehan, Morin
dc.contributor.authorCollaert, Nadine
dc.contributor.authorMercha, Abdelkarim
dc.contributor.authorTokei, Zsolt
dc.contributor.authorThean, Aaron
dc.contributor.authorVerkest, Diederik
dc.contributor.authorDe Meyer, Kristin
dc.date.accessioned2021-10-22T08:38:43Z
dc.date.available2021-10-22T08:38:43Z
dc.date.issued2014
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/24856
dc.sourceIIOimport
dc.titleLateral versus vertical gate-all-around FETs for beyond 7nm technologies
dc.typeProceedings paper
dc.contributor.imecauthorYakimets, Dmitry
dc.contributor.imecauthorGarcia Bardon, Marie
dc.contributor.imecauthorCollaert, Nadine
dc.contributor.imecauthorMercha, Abdelkarim
dc.contributor.imecauthorTokei, Zsolt
dc.contributor.imecauthorThean, Aaron
dc.contributor.imecauthorVerkest, Diederik
dc.contributor.imecauthorDe Meyer, Kristin
dc.contributor.orcidimecCollaert, Nadine::0000-0002-8062-3165
dc.contributor.orcidimecMercha, Abdelkarim::0000-0002-2174-6958
dc.contributor.orcidimecVerkest, Diederik::0000-0001-6567-2746
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage133
dc.source.endpage134
dc.source.conference72nd Device Research Conference - DRC
dc.source.conferencedate22/06/2014
dc.source.conferencelocationSanta Barbara, CA USA
dc.identifier.urlhttp://ieeexplore.ieee.org/xpl/articleDetails.jsp?tp=&arnumber=6872333&contentType=Conference+Publications
imec.availabilityPublished - open access


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