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High performance Si0.45Ge0.55 implant free quantum well pFET with enhanced mobility by low temperature process and transverse strain relaxation
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Authors
Yamaguchi, Shimpei
;
Witters, Liesbeth
;
Mitard, Jerome
;
Eneman, Geert
;
Hellings, Geert
;
Hikavyy, Andriy
;
Loo, Roger
;
Horiguchi, Naoto
ISSN
0018-9383
Issue
12
Journal
IEEE Transactions on Electron Devices
Volume
61
Title
High performance Si0.45Ge0.55 implant free quantum well pFET with enhanced mobility by low temperature process and transverse strain relaxation
Publication type
Journal article
Embargo date
9999-12-31
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