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Challenges in BEOL cleaning for the 10 nm node and beyond

dc.contributor.authorYu, David
dc.contributor.authorLe, Quoc Toan
dc.contributor.authorBraun, Simon
dc.contributor.authorKesters, Els
dc.contributor.authorShen, Mary
dc.contributor.authorKlipp, Andreas
dc.contributor.authorHolsteyns, Frank
dc.date.accessioned2021-10-22T08:46:29Z
dc.date.available2021-10-22T08:46:29Z
dc.date.issued2014
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/24870
dc.sourceIIOimport
dc.titleChallenges in BEOL cleaning for the 10 nm node and beyond
dc.typeMeeting abstract
dc.contributor.imecauthorLe, Quoc Toan
dc.contributor.imecauthorBraun, Simon
dc.contributor.imecauthorKesters, Els
dc.contributor.imecauthorHolsteyns, Frank
dc.contributor.orcidimecLe, Quoc Toan::0000-0002-0206-6279
dc.source.peerreviewno
dc.source.conferenceSematech Surface Preparation and Cleaning Conference
dc.source.conferencedate22/04/2014
dc.source.conferencelocationAustin, TX USA
imec.availabilityPublished - imec


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