Show simple item record

The chemistry screening for ultra low-k dielectrics plasma etching

dc.contributor.authorZotovich, A.
dc.contributor.authorKrishtab, Mikhail
dc.contributor.authorLazzarino, Frederic
dc.contributor.authorBaklanov, Mikhaïl
dc.date.accessioned2021-10-22T09:03:00Z
dc.date.available2021-10-22T09:03:00Z
dc.date.issued2014
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/24899
dc.sourceIIOimport
dc.titleThe chemistry screening for ultra low-k dielectrics plasma etching
dc.typeProceedings paper
dc.contributor.imecauthorKrishtab, Mikhail
dc.contributor.imecauthorLazzarino, Frederic
dc.contributor.orcidimecLazzarino, Frederic::0000-0001-7961-9727
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage944002
dc.source.conferenceInternational Conference on Micro- and Nano-Electronics
dc.source.conferencedate6/10/2014
dc.source.conferencelocationZvenigorod Russia
dc.identifier.urlhttp://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=2086463
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol. 9440


Files in this item

Thumbnail
Name:
31063.pdf
Size:
661.2Kb
Format:
PDF
View/open

This item appears in the following collection(s)

Show simple item record