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N7 logic via patterning using templated DSA: implementation aspects

dc.contributor.authorBekaert, Joost
dc.contributor.authorDoise, Jan
dc.contributor.authorGronheid, Roel
dc.contributor.authorRyckaert, Julien
dc.contributor.authorVandenberghe, Geert
dc.contributor.authorFenger, Germain
dc.contributor.authorHer, YoungJun
dc.contributor.authorCao, Yi
dc.date.accessioned2021-10-22T18:32:13Z
dc.date.available2021-10-22T18:32:13Z
dc.date.issued2015
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/24975
dc.sourceIIOimport
dc.titleN7 logic via patterning using templated DSA: implementation aspects
dc.typeProceedings paper
dc.contributor.imecauthorBekaert, Joost
dc.contributor.imecauthorDoise, Jan
dc.contributor.imecauthorGronheid, Roel
dc.contributor.imecauthorRyckaert, Julien
dc.contributor.imecauthorVandenberghe, Geert
dc.contributor.imecauthorHer, YoungJun
dc.contributor.orcidimecBekaert, Joost::0000-0003-3075-3479
dc.source.peerreviewyes
dc.source.beginpage965804
dc.source.conferencePhotomask Japan 2015: Photomask and Next-Generation Lithography Mask Technology XXII
dc.source.conferencedate20/04/2015
dc.source.conferencelocationYokohama Japan
dc.identifier.urlhttp://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=2397255
imec.availabilityPublished - imec
imec.internalnotesProceedings of SPIE; Vol. 9658


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