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Reducing agents for the atomic layer deposition of WS2 from the WF6 and H2S precursors

dc.contributor.authorDelabie, Annelies
dc.contributor.authorHeyne, Markus
dc.contributor.authorGroven, Benjamin
dc.contributor.authorHaesevoets, Karel
dc.contributor.authorMeersschaut, Johan
dc.contributor.authorNuytten, Thomas
dc.contributor.authorVerdonck, Patrick
dc.contributor.authorVan Elshocht, Sven
dc.contributor.authorHeyns, Marc
dc.contributor.authorRadu, Iuliana
dc.contributor.authorCaymax, Matty
dc.date.accessioned2021-10-22T18:57:38Z
dc.date.available2021-10-22T18:57:38Z
dc.date.issued2015-07
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/25182
dc.sourceIIOimport
dc.titleReducing agents for the atomic layer deposition of WS2 from the WF6 and H2S precursors
dc.typeProceedings paper
dc.contributor.imecauthorDelabie, Annelies
dc.contributor.imecauthorGroven, Benjamin
dc.contributor.imecauthorHaesevoets, Karel
dc.contributor.imecauthorMeersschaut, Johan
dc.contributor.imecauthorNuytten, Thomas
dc.contributor.imecauthorVerdonck, Patrick
dc.contributor.imecauthorVan Elshocht, Sven
dc.contributor.imecauthorHeyns, Marc
dc.contributor.imecauthorRadu, Iuliana
dc.contributor.imecauthorCaymax, Matty
dc.contributor.orcidimecGroven, Benjamin::0000-0002-5781-7594
dc.contributor.orcidimecMeersschaut, Johan::0000-0003-2467-1784
dc.contributor.orcidimecNuytten, Thomas::0000-0002-5921-6928
dc.contributor.orcidimecVerdonck, Patrick::0000-0003-2454-0602
dc.contributor.orcidimecVan Elshocht, Sven::0000-0002-6512-1909
dc.contributor.orcidimecRadu, Iuliana::0000-0002-7230-7218
dc.source.peerreviewyes
dc.source.beginpage-
dc.source.endpage-
dc.source.conference15th International Conference on Atomic Layer Deposition - ALD
dc.source.conferencedate28/06/2015
dc.source.conferencelocationPortland, OR USA
imec.availabilityPublished - imec


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