Show simple item record

Catalyst assisted low temperature pre epitaxial cleaning for Si and SiGe surfaces

dc.contributor.authorDhayalan, Sathish Kumar
dc.contributor.authorLoo, Roger
dc.contributor.authorHikavyy, Andriy
dc.contributor.authorRosseel, Erik
dc.contributor.authorWostyn, Kurt
dc.contributor.authorKenis, Karine
dc.contributor.authorShimura, Yosuke
dc.contributor.authorProfijt, Harald
dc.contributor.authorMaes, Jan
dc.contributor.authorDouhard, Bastien
dc.contributor.authorVandervorst, Wilfried
dc.date.accessioned2021-10-22T19:03:08Z
dc.date.available2021-10-22T19:03:08Z
dc.date.issued2015
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/25211
dc.sourceIIOimport
dc.titleCatalyst assisted low temperature pre epitaxial cleaning for Si and SiGe surfaces
dc.typeProceedings paper
dc.contributor.imecauthorLoo, Roger
dc.contributor.imecauthorHikavyy, Andriy
dc.contributor.imecauthorRosseel, Erik
dc.contributor.imecauthorWostyn, Kurt
dc.contributor.imecauthorKenis, Karine
dc.contributor.imecauthorMaes, Jan
dc.contributor.imecauthorDouhard, Bastien
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.orcidimecLoo, Roger::0000-0003-3513-6058
dc.contributor.orcidimecHikavyy, Andriy::0000-0002-8201-075X
dc.contributor.orcidimecWostyn, Kurt::0000-0003-3995-0292
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage16
dc.source.endpage19
dc.source.conferenceUltraclean Processing of Semiconductor Surfaces XII
dc.source.conferencedate21/09/2014
dc.source.conferencelocationBrussels Belgium
dc.identifier.urlhttp://www.scientific.net/SSP.219.16
imec.availabilityPublished - open access
imec.internalnotesSolid State Pehnomena; Vol. 219


Files in this item

Thumbnail
Name:
29577.pdf
Size:
75.62Kb
Format:
PDF
View/open

This item appears in the following collection(s)

Show simple item record