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dc.contributor.authorEl Otell, Ziad
dc.contributor.authorRingk, Andreas
dc.contributor.authorKolb, Tristan
dc.contributor.authorNeuber, Christian
dc.contributor.authorHaensel, Leander
dc.contributor.authorde Marneffe, Jean-Francois
dc.date.accessioned2021-10-22T19:10:45Z
dc.date.available2021-10-22T19:10:45Z
dc.date.issued2015-03
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/25250
dc.sourceIIOimport
dc.titleMolecular glass resist performance for nano-pattern transfer
dc.typeProceedings paper
dc.contributor.imecauthorEl Otell, Ziad
dc.contributor.imecauthorde Marneffe, Jean-Francois
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage94280J
dc.source.conferenceAdvanced Etch Technology for Nanopatterning IV
dc.source.conferencedate22/02/2015
dc.source.conferencelocationSan Jose, CA USA
dc.identifier.urlhttp://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=2209856
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol. 9428


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