dc.contributor.author | El Otell, Ziad | |
dc.contributor.author | Ringk, Andreas | |
dc.contributor.author | Kolb, Tristan | |
dc.contributor.author | Neuber, Christian | |
dc.contributor.author | Haensel, Leander | |
dc.contributor.author | de Marneffe, Jean-Francois | |
dc.date.accessioned | 2021-10-22T19:10:45Z | |
dc.date.available | 2021-10-22T19:10:45Z | |
dc.date.issued | 2015-03 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/25250 | |
dc.source | IIOimport | |
dc.title | Molecular glass resist performance for nano-pattern transfer | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | El Otell, Ziad | |
dc.contributor.imecauthor | de Marneffe, Jean-Francois | |
dc.date.embargo | 9999-12-31 | |
dc.source.peerreview | yes | |
dc.source.beginpage | 94280J | |
dc.source.conference | Advanced Etch Technology for Nanopatterning IV | |
dc.source.conferencedate | 22/02/2015 | |
dc.source.conferencelocation | San Jose, CA USA | |
dc.identifier.url | http://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=2209856 | |
imec.availability | Published - open access | |
imec.internalnotes | Proceedings of SPIE; Vol. 9428 | |