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Understanding the impact of CD-SEM artifacts on metrology via experiments and simulations

dc.contributor.authorFang, Chao
dc.contributor.authorVaglio Pret, Alessandro
dc.contributor.authorSmith, Mark D.
dc.contributor.authorBiafore, John J.
dc.contributor.authorRobertson, Steward
dc.contributor.authorBekaert, Joost
dc.date.accessioned2021-10-22T19:13:11Z
dc.date.available2021-10-22T19:13:11Z
dc.date.issued2015
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/25262
dc.sourceIIOimport
dc.titleUnderstanding the impact of CD-SEM artifacts on metrology via experiments and simulations
dc.typeProceedings paper
dc.contributor.imecauthorVaglio Pret, Alessandro
dc.contributor.imecauthorBekaert, Joost
dc.contributor.orcidimecBekaert, Joost::0000-0003-3075-3479
dc.source.peerreviewyes
dc.source.beginpage94242A
dc.source.conferenceMetrology, Inspection, and Process Control for Microlithography XXIX
dc.source.conferencedate22/02/2015
dc.source.conferencelocationSan Jose, CA USA
dc.identifier.urlhttp://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=2211010
imec.availabilityPublished - imec
imec.internalnotesProceedings of SPIE; Vol. 9424


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