Understanding the impact of CD-SEM artifacts on metrology via experiments and simulations

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Authors
Fang, Chao; Vaglio Pret, Alessandro; Smith, Mark D.; Biafore, John J.; Robertson, Steward; Bekaert, Joost
Conference
Metrology, Inspection, and Process Control for Microlithography XXIX
Title
Understanding the impact of CD-SEM artifacts on metrology via experiments and simulations
Publication type
Proceedings paper
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