Publication:

Understanding the impact of CD-SEM artifacts on metrology via experiments and simulations

Date

2015
Proceedings Paper
Simple item page Full metadata Statistics
 
dc.contributor.authorFang, Chao
dc.contributor.authorVaglio Pret, Alessandro
dc.contributor.authorSmith, Mark D.
dc.contributor.authorBiafore, John J.
dc.contributor.authorRobertson, Steward
dc.contributor.authorBekaert, Joost
dc.contributor.imecauthorVaglio Pret, Alessandro
dc.contributor.imecauthorBekaert, Joost
dc.contributor.orcidimecBekaert, Joost::0000-0003-3075-3479
dc.date.accessioned2021-10-22T19:13:11Z
dc.date.available2021-10-22T19:13:11Z
dc.date.issued2015
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/25262
dc.identifier.urlhttp://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=2211010
dc.source.beginpage94242A
dc.source.conferenceMetrology, Inspection, and Process Control for Microlithography XXIX
dc.source.conferencedate22/02/2015
dc.source.conferencelocationSan Jose, CA USA
dc.title

Understanding the impact of CD-SEM artifacts on metrology via experiments and simulations

dc.typeProceedings paper
dspace.entity.typePublication
Files
Publication available in collections:
Conference contributions