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Composition analysis of III-V materials grown in nanostructures for semiconductor applications: the self focusing SIMS approach

dc.contributor.authorFranquet, Alexis
dc.contributor.authorDouhard, Bastien
dc.contributor.authorMerckling, Clement
dc.contributor.authorConard, Thierry
dc.contributor.authorVandervorst, Wilfried
dc.date.accessioned2021-10-22T19:16:38Z
dc.date.available2021-10-22T19:16:38Z
dc.date.issued2015
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/25278
dc.sourceIIOimport
dc.titleComposition analysis of III-V materials grown in nanostructures for semiconductor applications: the self focusing SIMS approach
dc.typeMeeting abstract
dc.contributor.imecauthorFranquet, Alexis
dc.contributor.imecauthorDouhard, Bastien
dc.contributor.imecauthorMerckling, Clement
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.orcidimecFranquet, Alexis::0000-0002-7371-8852
dc.contributor.orcidimecMerckling, Clement::0000-0003-3084-2543
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpageSR1-ThM-1
dc.source.conference20th International Conference on Secondary Ion Mass Spectrometry - SIMS XX
dc.source.conferencedate13/09/2015
dc.source.conferencelocationSeattle, WA USA
imec.availabilityPublished - open access


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