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dc.contributor.authorGao, Weimin
dc.contributor.authorCiofi, Ivan
dc.contributor.authorSaad, Yves
dc.contributor.authorMatagne, Philippe
dc.contributor.authorBachman, Michael
dc.contributor.authorOulmane, Mohamed
dc.contributor.authorGillijns, Werner
dc.contributor.authorLucas, Kevin
dc.contributor.authorDemmerle, Wolfgang
dc.contributor.authorSchmoeller, Thomas
dc.date.accessioned2021-10-22T19:18:16Z
dc.date.available2021-10-22T19:18:16Z
dc.date.issued2015
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/25285
dc.sourceIIOimport
dc.titlePatterning process exploration of metal 1 layer in 7nm node with 3D pattering flow simulations
dc.typeProceedings paper
dc.contributor.imecauthorCiofi, Ivan
dc.contributor.imecauthorMatagne, Philippe
dc.contributor.imecauthorGillijns, Werner
dc.contributor.orcidimecCiofi, Ivan::0000-0003-1374-4116
dc.contributor.orcidimecGillijns, Werner::0000-0002-2430-7360
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage942609
dc.source.conferenceOptical Microlithographies XXVIII
dc.source.conferencedate22/02/2015
dc.source.conferencelocationSan Jose, CA USA
dc.identifier.urlhttp://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=2210053
imec.availabilityPublished - open access
imec.internalnotesProceedings o f SPIE; Vol. 9426


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