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Integrated fab process for metal oxide EUV photoresist

dc.contributor.authorGrenville, Andrew
dc.contributor.authorAnderson, Jeremy T.
dc.contributor.authorClark, Benjamin L.
dc.contributor.authorDe Schepper, Peter
dc.contributor.authorEdson, Joseph
dc.contributor.authorGreer, Michael
dc.contributor.authorKai, Jiang
dc.contributor.authorKocsis, Michael
dc.contributor.authorMeyers, Stephen T.
dc.contributor.authorStowers, Jason K.
dc.contributor.authorTelecky, Alan J.
dc.contributor.authorDe Simone, Danilo
dc.contributor.authorVandenberghe, Geert
dc.date.accessioned2021-10-22T19:30:59Z
dc.date.available2021-10-22T19:30:59Z
dc.date.issued2015
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/25339
dc.sourceIIOimport
dc.titleIntegrated fab process for metal oxide EUV photoresist
dc.typeProceedings paper
dc.contributor.imecauthorDe Schepper, Peter
dc.contributor.imecauthorGreer, Michael
dc.contributor.imecauthorKocsis, Michael
dc.contributor.imecauthorDe Simone, Danilo
dc.contributor.imecauthorVandenberghe, Geert
dc.contributor.orcidimecDe Simone, Danilo::0000-0003-3927-5207
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage94250S
dc.source.conferenceAdvances in Patterning Materials and Processes XXXII
dc.source.conferencedate22/02/2015
dc.source.conferencelocationSan Jose, CA USA
dc.identifier.urlhttp://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=2241752
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol. 9425


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