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A new paradigm for in-line detection and control of patterning defects

dc.contributor.authorHunsche, Stefan
dc.contributor.authorJochemsen, Marinus
dc.contributor.authorJain, Vivek
dc.contributor.authorZhou, Xinjian
dc.contributor.authorChen, Frank
dc.contributor.authorVellanki, Venu
dc.contributor.authorSpence, Chris
dc.contributor.authorHalder, Sandip
dc.contributor.authorVan Den Heuvel, Dieter
dc.contributor.authorTruffert, Vincent
dc.date.accessioned2021-10-22T19:47:38Z
dc.date.available2021-10-22T19:47:38Z
dc.date.issued2015
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/25404
dc.sourceIIOimport
dc.titleA new paradigm for in-line detection and control of patterning defects
dc.typeProceedings paper
dc.contributor.imecauthorJochemsen, Marinus
dc.contributor.imecauthorHalder, Sandip
dc.contributor.imecauthorVan Den Heuvel, Dieter
dc.contributor.imecauthorTruffert, Vincent
dc.contributor.orcidimecHalder, Sandip::0000-0002-6314-2685
dc.contributor.orcidimecTruffert, Vincent::0000-0001-7851-830X
dc.source.peerreviewyes
dc.source.conferenceMetrology, Inspection, and Process Control for Microlithography XXIX
dc.source.conferencedate22/02/2015
dc.source.conferencelocationSan Jose, CA USA
dc.identifier.urlhttp://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=2210980
imec.availabilityPublished - imec
imec.internalnotesProceedings of SPIE; Vol. 9424


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