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Post-etch template removal strategy for reduction of plasma induced damage in spin-on OSG low-k dielectrics
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Post-etch template removal strategy for reduction of plasma induced damage in spin-on OSG low-k dielectrics
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Date
2015
Proceedings Paper
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31717.pdf
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Krishtab, Mikhail
;
Vanstreels, Kris
;
Baklanov, Mikhaïl
;
De Gendt, Stefan
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1777
since deposited on 2021-10-22
Acq. date: 2025-12-18
Citations
Metrics
Views
1777
since deposited on 2021-10-22
Acq. date: 2025-12-18
Citations