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N7 middle of line etch challenges and solutions

dc.contributor.authorKunnen, Eddy
dc.contributor.authorBrouri, Mohand
dc.contributor.authorDemuynck, Steven
dc.contributor.authorVersluijs, Janko
dc.contributor.authorBoemmels, Juergen
dc.contributor.authorRyckaert, Julien
dc.date.accessioned2021-10-22T20:17:02Z
dc.date.available2021-10-22T20:17:02Z
dc.date.issued2015
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/25501
dc.sourceIIOimport
dc.titleN7 middle of line etch challenges and solutions
dc.typeMeeting abstract
dc.contributor.imecauthorDemuynck, Steven
dc.contributor.imecauthorVersluijs, Janko
dc.contributor.imecauthorBoemmels, Juergen
dc.contributor.imecauthorRyckaert, Julien
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.conferencePlasma Etch and Strip in Microtechnology - PESM
dc.source.conferencedate27/04/2015
dc.source.conferencelocationLeuven Belgium
dc.identifier.urlhttp://pesm-conference.org/files/2015_abstractbook.pdf
imec.availabilityPublished - open access


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