dc.contributor.author | Levinson, Zac | |
dc.contributor.author | Raghunathan, Sudhar | |
dc.contributor.author | Verduijn, Erik | |
dc.contributor.author | Wood, Obert | |
dc.contributor.author | Mangat, Pawitter | |
dc.contributor.author | Goldberg, Kenneth | |
dc.contributor.author | Benk, Markus | |
dc.contributor.author | Wojdyla, Antoine | |
dc.contributor.author | Philipsen, Vicky | |
dc.contributor.author | Hendrickx, Eric | |
dc.contributor.author | Smith, Bruce | |
dc.date.accessioned | 2021-10-22T20:27:45Z | |
dc.date.available | 2021-10-22T20:27:45Z | |
dc.date.issued | 2015 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/25535 | |
dc.source | IIOimport | |
dc.title | A method of image-based aberration metrology for EUVL tools | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Verduijn, Erik | |
dc.contributor.imecauthor | Philipsen, Vicky | |
dc.contributor.imecauthor | Hendrickx, Eric | |
dc.contributor.orcidimec | Philipsen, Vicky::0000-0002-2959-432X | |
dc.date.embargo | 9999-12-31 | |
dc.source.peerreview | yes | |
dc.source.beginpage | 942215 | |
dc.source.conference | Extreme Ultraviolet (EUV) Lithography VI | |
dc.source.conferencedate | 23/02/2015 | |
dc.source.conferencelocation | San Jose, CA USA | |
dc.identifier.url | http://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=2208407 | |
imec.availability | Published - open access | |
imec.internalnotes | Proceedings of SPIE; Vol. 9422 | |