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A method of image-based aberration metrology for EUVL tools

dc.contributor.authorLevinson, Zac
dc.contributor.authorRaghunathan, Sudhar
dc.contributor.authorVerduijn, Erik
dc.contributor.authorWood, Obert
dc.contributor.authorMangat, Pawitter
dc.contributor.authorGoldberg, Kenneth
dc.contributor.authorBenk, Markus
dc.contributor.authorWojdyla, Antoine
dc.contributor.authorPhilipsen, Vicky
dc.contributor.authorHendrickx, Eric
dc.contributor.authorSmith, Bruce
dc.date.accessioned2021-10-22T20:27:45Z
dc.date.available2021-10-22T20:27:45Z
dc.date.issued2015
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/25535
dc.sourceIIOimport
dc.titleA method of image-based aberration metrology for EUVL tools
dc.typeProceedings paper
dc.contributor.imecauthorVerduijn, Erik
dc.contributor.imecauthorPhilipsen, Vicky
dc.contributor.imecauthorHendrickx, Eric
dc.contributor.orcidimecPhilipsen, Vicky::0000-0002-2959-432X
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage942215
dc.source.conferenceExtreme Ultraviolet (EUV) Lithography VI
dc.source.conferencedate23/02/2015
dc.source.conferencelocationSan Jose, CA USA
dc.identifier.urlhttp://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=2208407
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol. 9422


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