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Modeling EUV mask using alternative materials for mask 3D effect compensation

dc.contributor.authorLuong, Vu
dc.contributor.authorPhilipsen, Vicky
dc.contributor.authorVerduijn, Erik
dc.contributor.authorScholze, Frank
dc.contributor.authorHendrickx, Eric
dc.contributor.authorHeyns, Marc
dc.contributor.authorWood, Obert
dc.date.accessioned2021-10-22T20:44:40Z
dc.date.available2021-10-22T20:44:40Z
dc.date.issued2015
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/25586
dc.sourceIIOimport
dc.titleModeling EUV mask using alternative materials for mask 3D effect compensation
dc.typeProceedings paper
dc.contributor.imecauthorLuong, Vu
dc.contributor.imecauthorPhilipsen, Vicky
dc.contributor.imecauthorVerduijn, Erik
dc.contributor.imecauthorHendrickx, Eric
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecPhilipsen, Vicky::0000-0002-2959-432X
dc.source.peerreviewno
dc.source.beginpagena
dc.source.conferenceInternational Symposium on Extreme Ultraviolet Lithography - EUVL
dc.source.conferencedate5/10/2015
dc.source.conferencelocationMaastricht Netherlands
dc.identifier.urlhttp://euvlsymposium.lbl.gov/proceedings/2015
imec.availabilityPublished - imec


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