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Near room temperature plasma enhanced atomic layer deposition of ruthenium using the RuO4 -precursor and H2 -plasma
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Authors
Minjauw, Matthias
;
Dendooven, Jolien
;
Capon, Boris
;
Schaekers, Marc
;
Detavernier, Christophe
ISSN
2050-7526
Issue
19
Journal
Journal of Materials Chemistry C
Volume
3
Title
Near room temperature plasma enhanced atomic layer deposition of ruthenium using the RuO4 -precursor and H2 -plasma
Publication type
Journal article
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