Atomic layer deposition of ruthenium at 100°C using the RuO4-precursor and H2

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Authors

Minjauw, Matthias; Dendooven, Jolien; Capon, Boris; Schaekers, Marc; Detavernier, Christophe

ISSN

2050-7526

Issue

1

Journal

Journal of Materials Chemistry C

Volume

3

Title

Atomic layer deposition of ruthenium at 100°C using the RuO4-precursor and H2

Publication type

Journal article

Embargo date

9999-12-31

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