Line Edge Roughness on Directed Self Assembly: Impact of process conditions
dc.contributor.author | MKuppuswamy, Vijaya Kumar | |
dc.contributor.author | Williamson, Lance | |
dc.contributor.author | Pathangi Sriraman, Hari | |
dc.contributor.author | Seidel, Robert | |
dc.contributor.author | Gronheid, Roel | |
dc.contributor.author | Nealey, Paul | |
dc.contributor.author | Lin, Guanyang | |
dc.contributor.author | Cao, Yi | |
dc.date.accessioned | 2021-10-22T21:09:34Z | |
dc.date.available | 2021-10-22T21:09:34Z | |
dc.date.issued | 2015 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/25655 | |
dc.source | IIOimport | |
dc.title | Line Edge Roughness on Directed Self Assembly: Impact of process conditions | |
dc.type | Meeting abstract | |
dc.contributor.imecauthor | Gronheid, Roel | |
dc.source.peerreview | no | |
dc.source.beginpage | 9424-31 | |
dc.source.conference | SPIE Advance Lithography 2015 | |
dc.source.conferencedate | 22/02/2015 | |
dc.source.conferencelocation | San Jose, CA USA | |
imec.availability | Published - imec |
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