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dc.contributor.authorMKuppuswamy, Vijaya Kumar
dc.contributor.authorWilliamson, Lance
dc.contributor.authorPathangi Sriraman, Hari
dc.contributor.authorSeidel, Robert
dc.contributor.authorGronheid, Roel
dc.contributor.authorNealey, Paul
dc.contributor.authorLin, Guanyang
dc.contributor.authorCao, Yi
dc.date.accessioned2021-10-22T21:09:34Z
dc.date.available2021-10-22T21:09:34Z
dc.date.issued2015
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/25655
dc.sourceIIOimport
dc.titleLine Edge Roughness on Directed Self Assembly: Impact of process conditions
dc.typeMeeting abstract
dc.contributor.imecauthorGronheid, Roel
dc.source.peerreviewno
dc.source.beginpage9424-31
dc.source.conferenceSPIE Advance Lithography 2015
dc.source.conferencedate22/02/2015
dc.source.conferencelocationSan Jose, CA USA
imec.availabilityPublished - imec


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