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The IMEC Clean concept : an advanced wafer cleaning technology

dc.contributor.authorMeuris, Marc
dc.contributor.authorVerhaverbeke, Steven
dc.contributor.authorMertens, Paul
dc.contributor.authorSchmidt, Harald
dc.contributor.authorRotondaro, Antonio
dc.contributor.authorHeyns, Marc
dc.contributor.authorDepas, Michel
dc.contributor.authorPhilipossian, A.
dc.contributor.authorVatel, Oliver
dc.date.accessioned2021-09-29T12:43:52Z
dc.date.available2021-09-29T12:43:52Z
dc.date.issued1994
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/256
dc.sourceIIOimport
dc.titleThe IMEC Clean concept : an advanced wafer cleaning technology
dc.typeOral presentation
dc.contributor.imecauthorMeuris, Marc
dc.contributor.imecauthorMertens, Paul
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecMeuris, Marc::0000-0002-9580-6810
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.conference23rd Symposium on ULSI Ultra Clean Technology
dc.source.conferencedate16/11/1994
dc.source.conferencelocationToyocho Japan
imec.availabilityPublished - open access


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