Updates on Ge AND SiGe CMP processes for integration as high mobility channel materials

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Authors
Ong, Patrick; Teugels, Lieve; Ansar, Sheikh; Delande, Tinne; Bhonsle, Rithu; Siebert, Max; Leunissen, Leonardus
Conference
International Conference on Planarization/CMP Technology - ICPT
Title
Updates on Ge AND SiGe CMP processes for integration as high mobility channel materials
Publication type
Meeting abstract
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