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Status update on a new class of solution processable low-k dielectric coating for use as ILD with k <2.4

dc.contributor.authorPakbaz, Hash
dc.contributor.authorHacker, N
dc.contributor.authorTokei, Zsolt
dc.contributor.authorBaklanov, Mikhaïl
dc.date.accessioned2021-10-22T21:35:16Z
dc.date.available2021-10-22T21:35:16Z
dc.date.issued2015
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/25723
dc.sourceIIOimport
dc.titleStatus update on a new class of solution processable low-k dielectric coating for use as ILD with k <2.4
dc.typeMeeting abstract
dc.contributor.imecauthorTokei, Zsolt
dc.source.peerreviewyes
dc.source.beginpageEM-ThM5
dc.source.conferenceAVS 62nd International Symposium & Exhibition
dc.source.conferencedate18/10/2015
dc.source.conferencelocationSan Jose, CA USA
dc.identifier.urlhttp://www2.avs.org/symposium2015/Papers/Paper_EM-ThM5.html
imec.availabilityPublished - imec


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