Sub-0.25 micron lithography applying illumination pupil filtering (quadrupole) on a DUV step-and-repeat system
dc.contributor.author | Finders, Jo | |
dc.contributor.author | Mulders, A. M. | |
dc.contributor.author | Krist, J. | |
dc.contributor.author | Flagello, D. | |
dc.contributor.author | Luehrmann, P. | |
dc.contributor.author | Maenhoudt, Mireille | |
dc.contributor.author | Marschner, Thomas | |
dc.contributor.author | De Bisschop, Peter | |
dc.contributor.author | Ronse, Kurt | |
dc.date.accessioned | 2021-09-30T11:57:19Z | |
dc.date.available | 2021-09-30T11:57:19Z | |
dc.date.issued | 1998 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/2573 | |
dc.source | IIOimport | |
dc.title | Sub-0.25 micron lithography applying illumination pupil filtering (quadrupole) on a DUV step-and-repeat system | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | De Bisschop, Peter | |
dc.contributor.imecauthor | Ronse, Kurt | |
dc.date.embargo | 9999-12-31 | |
dc.source.peerreview | no | |
dc.source.beginpage | 81 | |
dc.source.endpage | 92 | |
dc.source.conference | OLIN Microlithography Symposium. Interface '98 | |
dc.source.conferencedate | 15/11/1998 | |
dc.source.conferencelocation | San Diego, CA USA | |
imec.availability | Published - open access |