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dc.contributor.authorPathangi Sriraman, Hari
dc.contributor.authorVan Den Heuvel, Dieter
dc.contributor.authorBayana, Hareen
dc.contributor.authorBouckou, Loemba
dc.contributor.authorBrown, Jim
dc.contributor.authorParisi, Paolo
dc.contributor.authorGosain, Rohan
dc.date.accessioned2021-10-22T21:43:43Z
dc.date.available2021-10-22T21:43:43Z
dc.date.issued2015
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/25744
dc.sourceIIOimport
dc.titleThe use of eDR-71xx for DSA defect review and automated classification
dc.typeProceedings paper
dc.contributor.imecauthorVan Den Heuvel, Dieter
dc.contributor.imecauthorBayana, Hareen
dc.contributor.imecauthorParisi, Paolo
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage94242F
dc.source.conferenceMetrology, Inspection, and Process Control for Microlithography XXIX
dc.source.conferencedate21/02/2015
dc.source.conferencelocationSan Jose, CA USA
dc.identifier.urlhttp://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=2211015
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol. 9424


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