Show simple item record

Supercritical CO2 etching of metal thin films for magnetoresistive memory processing

dc.contributor.authorRasadujjaman, M
dc.contributor.authorNakamura, Y.
dc.contributor.authorWatanabe, M.
dc.contributor.authorKondoh, E.
dc.contributor.authorBaklanov, Mikhaïl
dc.date.accessioned2021-10-22T22:08:11Z
dc.date.available2021-10-22T22:08:11Z
dc.date.issued2015
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/25803
dc.sourceIIOimport
dc.titleSupercritical CO2 etching of metal thin films for magnetoresistive memory processing
dc.typeMeeting abstract
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.conference41st Micro and Nanoengineering Conference - MNE
dc.source.conferencedate21/09/2015
dc.source.conferencelocationDelft Nederlands
imec.availabilityPublished - open access


Files in this item

Thumbnail
Name:
32300.pdf
Size:
189.5Kb
Format:
PDF
View/open

This item appears in the following collection(s)

Show simple item record