Investigation of plasma damage of low-k dielectrics during cryogenic etching
| dc.contributor.author | Rezvanov, A. | |
| dc.contributor.author | Miakonkikh, A. | |
| dc.contributor.author | Vishnevsky, A. | |
| dc.contributor.author | Gutshin, O. | |
| dc.contributor.author | Gornev, E. | |
| dc.contributor.author | Krasnikov, G. | |
| dc.contributor.author | Mogilnikov, K. | |
| dc.contributor.author | Rudenko, K. | |
| dc.contributor.author | Baklanov, Mikhaïl | |
| dc.date.accessioned | 2021-10-22T22:13:47Z | |
| dc.date.available | 2021-10-22T22:13:47Z | |
| dc.date.issued | 2015 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/25816 | |
| dc.source | IIOimport | |
| dc.title | Investigation of plasma damage of low-k dielectrics during cryogenic etching | |
| dc.type | Proceedings paper | |
| dc.source.peerreview | yes | |
| dc.source.conference | Microelectronics - 2015 | |
| dc.source.conferencedate | 28/09/2015 | |
| dc.source.conferencelocation | Alushta Russia | |
| imec.availability | Published - imec |
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