dc.contributor.author | Rezvanov, A. | |
dc.contributor.author | Mogilnikov, K. | |
dc.contributor.author | Gutshin, O. | |
dc.contributor.author | Gornev, E. | |
dc.contributor.author | Krasnikov, G. | |
dc.contributor.author | Zhang, Liping | |
dc.contributor.author | Dussarrat, C. | |
dc.contributor.author | de Marneffe, Jean-Francois | |
dc.contributor.author | Baklanov, Mikhaïl | |
dc.date.accessioned | 2021-10-22T22:14:13Z | |
dc.date.available | 2021-10-22T22:14:13Z | |
dc.date.issued | 2015 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/25817 | |
dc.source | IIOimport | |
dc.title | Adsorption isobars of fluorocarbon compounds selected for cryogenic etching of low-k materials | |
dc.type | Meeting abstract | |
dc.contributor.imecauthor | Zhang, Liping | |
dc.contributor.imecauthor | de Marneffe, Jean-Francois | |
dc.source.peerreview | no | |
dc.source.beginpage | BB2.03 | |
dc.source.conference | Spring MRS Meeting Symposium BB: Innovative Interconnects/Electrodes for Advances Devices, Flexible and Green Energy Electronics | |
dc.source.conferencedate | 6/04/2015 | |
dc.source.conferencelocation | San Francisco, CA USA | |
imec.availability | Published - imec | |