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dc.contributor.authorSayan, Safak
dc.contributor.authorChan, BT
dc.contributor.authorMarzook, Taisir
dc.contributor.authorVandenbroeck, Nadia
dc.contributor.authorAltamirano Sanchez, Efrain
dc.contributor.authorGronheid, Roel
dc.contributor.authorSingh, Arjun
dc.contributor.authorRincon Delgadillo, Paulina
dc.date.accessioned2021-10-22T22:35:36Z
dc.date.available2021-10-22T22:35:36Z
dc.date.issued2015
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/25867
dc.sourceIIOimport
dc.titleDirected self-assembly process integration – fin patterning
dc.typeProceedings paper
dc.contributor.imecauthorChan, BT
dc.contributor.imecauthorVandenbroeck, Nadia
dc.contributor.imecauthorAltamirano Sanchez, Efrain
dc.contributor.imecauthorGronheid, Roel
dc.contributor.imecauthorSingh, Arjun
dc.contributor.imecauthorRincon Delgadillo, Paulina
dc.contributor.orcidimecChan, BT::0000-0003-2890-0388
dc.contributor.orcidimecAltamirano Sanchez, Efrain::0000-0003-3235-6055
dc.source.peerreviewyes
dc.source.beginpage94250R
dc.source.conferenceAdvances in Patterning Materials and Processes XXXII
dc.source.conferencedate22/02/2015
dc.source.conferencelocationSan Jose, CA USA
dc.identifier.urlhttp://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=1854371
imec.availabilityPublished - imec
imec.internalnotesSPIE Proceedings; Vol. 9425


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