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Dry development rinse process for ultimate resolution Improvement via pattern collapse mitigation

dc.contributor.authorSayan, Safak
dc.contributor.authorTao, Zheng
dc.contributor.authorChan, BT
dc.contributor.authorDe Simone, Danilo
dc.contributor.authorKuwahara, Yuhei
dc.contributor.authorNafus, Kathleen
dc.contributor.authorLeeson, Michael J.
dc.contributor.authorGstrein, Florian
dc.contributor.authorSingh, Arjun
dc.contributor.authorVandenberghe, Geert
dc.date.accessioned2021-10-22T22:36:04Z
dc.date.available2021-10-22T22:36:04Z
dc.date.issued2015
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/25868
dc.sourceIIOimport
dc.titleDry development rinse process for ultimate resolution Improvement via pattern collapse mitigation
dc.typeProceedings paper
dc.contributor.imecauthorTao, Zheng
dc.contributor.imecauthorChan, BT
dc.contributor.imecauthorDe Simone, Danilo
dc.contributor.imecauthorNafus, Kathleen
dc.contributor.imecauthorSingh, Arjun
dc.contributor.imecauthorVandenberghe, Geert
dc.contributor.orcidimecChan, BT::0000-0003-2890-0388
dc.contributor.orcidimecDe Simone, Danilo::0000-0003-3927-5207
dc.source.peerreviewyes
dc.source.beginpage942516
dc.source.conferenceAdvances in Patterning Materials and Processes XXXII
dc.source.conferencedate22/02/2015
dc.source.conferencelocationSan Jose, CA USA
dc.identifier.urlhttp://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=2238734
imec.availabilityPublished - imec
imec.internalnotesProceedings of SPIE; Vol. 9425


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