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Lithographic performance of 193 nm resist

dc.contributor.authorGoethals, Mieke
dc.contributor.authorPollers, Ingrid
dc.contributor.authorVan Roey, Frieda
dc.contributor.authorSugihara, Takashi
dc.contributor.authorRonse, Kurt
dc.contributor.authorHeskamp, B.
dc.contributor.authorDavies, G.
dc.contributor.authorGehoel-van Ansem, W.
dc.contributor.authorPaniez, P.
dc.contributor.authorTemerson, T. M.
dc.contributor.authorHien, S.
dc.contributor.authorMortini, B.
dc.contributor.authorRomeo, C.
dc.date.accessioned2021-09-30T12:00:36Z
dc.date.available2021-09-30T12:00:36Z
dc.date.issued1998
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/2587
dc.sourceIIOimport
dc.titleLithographic performance of 193 nm resist
dc.typeProceedings paper
dc.contributor.imecauthorVan Roey, Frieda
dc.contributor.imecauthorRonse, Kurt
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpageP-020
dc.source.conference193nm '98. At the Peak. 4th International Symposium on 193 nm Lithography. Abstracts Book
dc.source.conferencedate14/09/1998
dc.source.conferencelocationTelfs Austria
imec.availabilityPublished - open access


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