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EUV scanner printability evaluation of natural blank defects detected by actinic blank inspection

dc.contributor.authorTakagi, Noriaki
dc.contributor.authorWatanabe, Hidehiro
dc.contributor.authorVan Den Heuvel, Dieter
dc.contributor.authorJonckheere, Rik
dc.contributor.authorGallagher, Emily
dc.date.accessioned2021-10-22T23:24:02Z
dc.date.available2021-10-22T23:24:02Z
dc.date.issued2015-07
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/25974
dc.sourceIIOimport
dc.titleEUV scanner printability evaluation of natural blank defects detected by actinic blank inspection
dc.typeProceedings paper
dc.contributor.imecauthorVan Den Heuvel, Dieter
dc.contributor.imecauthorJonckheere, Rik
dc.contributor.imecauthorGallagher, Emily
dc.contributor.orcidimecJonckheere, Rik::0000-0003-2211-9443
dc.contributor.orcidimecGallagher, Emily::0000-0002-2927-8298
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage96580F
dc.source.conferencePhotomask Japan 2015: Photomask and Next-Generation Lithography Mask Technology XXII
dc.source.conferencedate20/04/2015
dc.source.conferencelocationYokohama Japan
dc.identifier.urlhttp://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=2397264
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol. 9658


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