dc.contributor.author | van Dorp, Dennis | |
dc.contributor.author | Weinberger, David | |
dc.contributor.author | Van wonterghem, S. | |
dc.contributor.author | Arnauts, Sophia | |
dc.contributor.author | Strubbe, Katrien | |
dc.contributor.author | Holsteyns, Frank | |
dc.contributor.author | De Gendt, Stefan | |
dc.date.accessioned | 2021-10-23T00:01:46Z | |
dc.date.available | 2021-10-23T00:01:46Z | |
dc.date.issued | 2015-10 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/26054 | |
dc.source | IIOimport | |
dc.title | Nanoscale etching: dissolution of III-As and Ge in HCl/H2O2 solutions | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | van Dorp, Dennis | |
dc.contributor.imecauthor | Arnauts, Sophia | |
dc.contributor.imecauthor | Holsteyns, Frank | |
dc.contributor.imecauthor | De Gendt, Stefan | |
dc.contributor.orcidimec | van Dorp, Dennis::0000-0002-1085-4232 | |
dc.contributor.orcidimec | De Gendt, Stefan::0000-0003-3775-3578 | |
dc.date.embargo | 9999-12-31 | |
dc.source.peerreview | yes | |
dc.source.beginpage | 235 | |
dc.source.endpage | 242 | |
dc.source.conference | Semiconductor Cleaning Science and Technology 14 - SCST 14 | |
dc.source.conferencedate | 11/10/2015 | |
dc.source.conferencelocation | Phoenix, AZ USA | |
dc.identifier.url | http://ecst.ecsdl.org/content/69/8/235.full.pdf+html | |
imec.availability | Published - open access | |
imec.internalnotes | ECS Transactions; Vol. 69, Issue 8 | |