dc.contributor.author | Van Huylenbroeck, Stefaan | |
dc.contributor.author | Li, Yunlong | |
dc.contributor.author | Heylen, Nancy | |
dc.contributor.author | Croes, Kristof | |
dc.contributor.author | Beyer, Gerald | |
dc.contributor.author | Beyne, Eric | |
dc.contributor.author | Brouri, Mohand | |
dc.contributor.author | Gopinath, Sanjay | |
dc.contributor.author | Nalla, Praveen | |
dc.contributor.author | Thorum, Matthew | |
dc.contributor.author | Meshram, Prashant | |
dc.contributor.author | Anjos, Daniela M. | |
dc.contributor.author | Yu, Jengyi | |
dc.date.accessioned | 2021-10-23T00:09:47Z | |
dc.date.available | 2021-10-23T00:09:47Z | |
dc.date.issued | 2015 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/26073 | |
dc.source | IIOimport | |
dc.title | Advanced metallization scheme for 3×50μm via middle TSV and beyond | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Van Huylenbroeck, Stefaan | |
dc.contributor.imecauthor | Li, Yunlong | |
dc.contributor.imecauthor | Heylen, Nancy | |
dc.contributor.imecauthor | Croes, Kristof | |
dc.contributor.imecauthor | Beyer, Gerald | |
dc.contributor.imecauthor | Beyne, Eric | |
dc.contributor.orcidimec | Van Huylenbroeck, Stefaan::0000-0001-9978-3575 | |
dc.contributor.orcidimec | Li, Yunlong::0000-0003-4791-4013 | |
dc.contributor.orcidimec | Croes, Kristof::0000-0002-3955-0638 | |
dc.contributor.orcidimec | Beyne, Eric::0000-0002-3096-050X | |
dc.date.embargo | 9999-12-31 | |
dc.source.peerreview | yes | |
dc.source.beginpage | 66 | |
dc.source.endpage | 72 | |
dc.source.conference | IEEE 65th Electronic Components & Technology Conference - ECTC | |
dc.source.conferencedate | 26/05/2015 | |
dc.source.conferencelocation | San Diego, CA USA | |
dc.identifier.url | http://ieeexplore.ieee.org/xpl/articleDetails.jsp?arnumber=7159573 | |
imec.availability | Published - imec | |