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Experimental validation of novel EUV mask technology to reduce mask 3D effects

dc.contributor.authorVan Look, Lieve
dc.contributor.authorPhilipsen, Vicky
dc.contributor.authorHendrickx, Eric
dc.contributor.authorDavydova, Natalia
dc.contributor.authorWittebrood, Friso
dc.contributor.authorDe Kruif, Robert
dc.contributor.authorVan Oosten, Anton
dc.contributor.authorMiyazaki, Junji
dc.contributor.authorFliervoet, Timon
dc.contributor.authorVan Schoot, Jan
dc.contributor.authorNeumann, Jens Timo
dc.date.accessioned2021-10-23T00:14:47Z
dc.date.available2021-10-23T00:14:47Z
dc.date.issued2015
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/26084
dc.sourceIIOimport
dc.titleExperimental validation of novel EUV mask technology to reduce mask 3D effects
dc.typeProceedings paper
dc.contributor.imecauthorVan Look, Lieve
dc.contributor.imecauthorPhilipsen, Vicky
dc.contributor.imecauthorHendrickx, Eric
dc.contributor.imecauthorFliervoet, Timon
dc.contributor.orcidimecPhilipsen, Vicky::0000-0002-2959-432X
dc.source.peerreviewyes
dc.source.beginpage966109
dc.source.conference31st European Mask and Lithography Conference
dc.source.conferencedate22/06/2015
dc.source.conferencelocationWashington USA
dc.identifier.urlhttp://proceedings.spiedigitallibrary.org
imec.availabilityPublished - imec
imec.internalnotesProceedings of SPIE; Vol. 9661


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