Show simple item record

Alternative EUV mask technology to compensate for mask 3D effects

dc.contributor.authorVan Look, Lieve
dc.contributor.authorPhilipsen, Vicky
dc.contributor.authorHendrickx, Eric
dc.contributor.authorVandenberghe, Geert
dc.contributor.authorDavydova, Natalia
dc.contributor.authorWittebrood, Friso
dc.contributor.authorDe Kruif, Robert
dc.contributor.authorVan Oosten, Anton
dc.contributor.authorMiyazaki, Junji
dc.contributor.authorFliervoet, Timon
dc.contributor.authorVan Schoot, Jan
dc.contributor.authorNeumann, Jens Timo
dc.date.accessioned2021-10-23T00:15:52Z
dc.date.available2021-10-23T00:15:52Z
dc.date.issued2015
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/26086
dc.sourceIIOimport
dc.titleAlternative EUV mask technology to compensate for mask 3D effects
dc.typeProceedings paper
dc.contributor.imecauthorVan Look, Lieve
dc.contributor.imecauthorPhilipsen, Vicky
dc.contributor.imecauthorHendrickx, Eric
dc.contributor.imecauthorVandenberghe, Geert
dc.contributor.imecauthorFliervoet, Timon
dc.contributor.orcidimecPhilipsen, Vicky::0000-0002-2959-432X
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage96580I
dc.source.conferencePhotomask Japan 2015: Photomask and Next-Generation Lithography Mask Technology XXII
dc.source.conferencedate20/04/2015
dc.source.conferencelocationYokohama Japan
dc.identifier.urlhttp://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=2397267
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol. 9658


Files in this item

Thumbnail
Name:
31967.pdf
Size:
1.406Mb
Format:
PDF
View/open

This item appears in the following collection(s)

Show simple item record