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Gate-all-around NWFETs vs. triple-gate FinFETs: junctionless vs. extensionless and conventional junction devices with controlled EWF modulation for multi-VT CMOS

dc.contributor.authorVeloso, Anabela
dc.contributor.authorHellings, Geert
dc.contributor.authorCho, Moon Ju
dc.contributor.authorSimoen, Eddy
dc.contributor.authorDevriendt, Katia
dc.contributor.authorParaschiv, Vasile
dc.contributor.authorVecchio, Emma
dc.contributor.authorTao, Zheng
dc.contributor.authorVersluijs, Janko
dc.contributor.authorSouriau, Laurent
dc.contributor.authorDekkers, Harold
dc.contributor.authorBrus, Stephan
dc.contributor.authorGeypen, Jef
dc.contributor.authorLagrain, Pieter
dc.contributor.authorBender, Hugo
dc.contributor.authorEneman, Geert
dc.contributor.authorMatagne, Philippe
dc.contributor.authorDe Keersgieter, An
dc.contributor.authorFang, W.
dc.contributor.authorCollaert, Nadine
dc.contributor.authorThean, Aaron
dc.date.accessioned2021-10-23T00:31:20Z
dc.date.available2021-10-23T00:31:20Z
dc.date.issued2015
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/26117
dc.sourceIIOimport
dc.titleGate-all-around NWFETs vs. triple-gate FinFETs: junctionless vs. extensionless and conventional junction devices with controlled EWF modulation for multi-VT CMOS
dc.typeProceedings paper
dc.contributor.imecauthorVeloso, Anabela
dc.contributor.imecauthorHellings, Geert
dc.contributor.imecauthorSimoen, Eddy
dc.contributor.imecauthorDevriendt, Katia
dc.contributor.imecauthorParaschiv, Vasile
dc.contributor.imecauthorVecchio, Emma
dc.contributor.imecauthorTao, Zheng
dc.contributor.imecauthorVersluijs, Janko
dc.contributor.imecauthorSouriau, Laurent
dc.contributor.imecauthorDekkers, Harold
dc.contributor.imecauthorBrus, Stephan
dc.contributor.imecauthorGeypen, Jef
dc.contributor.imecauthorLagrain, Pieter
dc.contributor.imecauthorBender, Hugo
dc.contributor.imecauthorEneman, Geert
dc.contributor.imecauthorMatagne, Philippe
dc.contributor.imecauthorDe Keersgieter, An
dc.contributor.imecauthorCollaert, Nadine
dc.contributor.imecauthorThean, Aaron
dc.contributor.orcidimecHellings, Geert::0000-0002-5376-2119
dc.contributor.orcidimecSimoen, Eddy::0000-0002-5218-4046
dc.contributor.orcidimecDevriendt, Katia::0000-0002-0662-7926
dc.contributor.orcidimecSouriau, Laurent::0000-0002-5138-5938
dc.contributor.orcidimecDekkers, Harold::0000-0003-4778-5709
dc.contributor.orcidimecLagrain, Pieter::0000-0003-3734-7203
dc.contributor.orcidimecEneman, Geert::0000-0002-5849-3384
dc.contributor.orcidimecDe Keersgieter, An::0000-0002-5527-8582
dc.contributor.orcidimecCollaert, Nadine::0000-0002-8062-3165
dc.source.peerreviewyes
dc.source.beginpageT138
dc.source.endpageT139
dc.source.conferenceSymposium on VLSI Technology
dc.source.conferencedate15/06/2015
dc.source.conferencelocationKyoto Japan
dc.identifier.urlhttp://ieeexplore.ieee.org/xpl/articleDetails.jsp?arnumber=7223652
imec.availabilityPublished - imec


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