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Chemistry of the silicon oxide surface: adsorption from SC1 solutions

dc.contributor.authorHall, L.
dc.contributor.authorSees, J.
dc.contributor.authorHurd, Trace
dc.contributor.authorSchmidt, B.
dc.contributor.authorBellay, L.
dc.contributor.authorLoewenstein, Lee
dc.contributor.authorMertens, Paul
dc.date.accessioned2021-09-30T12:07:38Z
dc.date.available2021-09-30T12:07:38Z
dc.date.issued1998
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/2617
dc.sourceIIOimport
dc.titleChemistry of the silicon oxide surface: adsorption from SC1 solutions
dc.typeOral presentation
dc.contributor.imecauthorMertens, Paul
dc.source.peerreviewno
dc.source.conference4th International Symposium on Ultra Clean Processing of Silicon Surfaces - UCPSS
dc.source.conferencedate21/09/1998
dc.source.conferencelocationOostende Belgium
imec.availabilityPublished - imec
imec.internalnotesPubl. in 1999; Zie C3448


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