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Alternative materials for high numerical aperture extreme ultraviolet lithography mask stacks

dc.contributor.authorWood, Obert
dc.contributor.authorRaghunathan, Sudhar
dc.contributor.authorMangat, Pawitter
dc.contributor.authorPhilipsen, Vicky
dc.contributor.authorLuong, Vu
dc.contributor.authorKearney, Patrick
dc.contributor.authorVerduijn, Erik
dc.contributor.authorKumar, Aditya
dc.contributor.authorPatil, Suraj
dc.contributor.authorLaubis, Christian
dc.contributor.authorSoltwisch, Victor
dc.contributor.authorScholze, Frank
dc.date.accessioned2021-10-23T01:04:44Z
dc.date.available2021-10-23T01:04:44Z
dc.date.issued2015
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/26184
dc.sourceIIOimport
dc.titleAlternative materials for high numerical aperture extreme ultraviolet lithography mask stacks
dc.typeProceedings paper
dc.contributor.imecauthorPhilipsen, Vicky
dc.contributor.imecauthorLuong, Vu
dc.contributor.imecauthorVerduijn, Erik
dc.contributor.orcidimecPhilipsen, Vicky::0000-0002-2959-432X
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage94220I
dc.source.conferenceExtreme Ultraviolet (EUV) Lithography VI
dc.source.conferencedate22/02/2015
dc.source.conferencelocationSan Jose, CA USA
dc.identifier.urlhttp://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=2208395
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol. 9422


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