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Enabling GeH4-HCl in-situ pre-epi clean: impact of water quality on HF last process performance

dc.contributor.authorWostyn, Kurt
dc.contributor.authorRondas, Dirk
dc.contributor.authorLoo, Roger
dc.contributor.authorDhayalan, Sathish Kumar
dc.contributor.authorHikavyy, Andriy
dc.contributor.authorElskens, Wim
dc.contributor.authorVyncke, Alex
dc.contributor.authorMertens, Paul
dc.contributor.authorHolsteyns, Frank
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorMasaoka, Toru
dc.contributor.authorYoshida, Yukifumi
dc.contributor.authorBast, Gerhard
dc.contributor.authorSimpson, Gavin
dc.date.accessioned2021-10-23T01:05:21Z
dc.date.available2021-10-23T01:05:21Z
dc.date.issued2015
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/26185
dc.sourceIIOimport
dc.titleEnabling GeH4-HCl in-situ pre-epi clean: impact of water quality on HF last process performance
dc.typeMeeting abstract
dc.contributor.imecauthorWostyn, Kurt
dc.contributor.imecauthorRondas, Dirk
dc.contributor.imecauthorLoo, Roger
dc.contributor.imecauthorHikavyy, Andriy
dc.contributor.imecauthorElskens, Wim
dc.contributor.imecauthorMertens, Paul
dc.contributor.imecauthorHolsteyns, Frank
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorBast, Gerhard
dc.contributor.imecauthorSimpson, Gavin
dc.contributor.orcidimecWostyn, Kurt::0000-0003-3995-0292
dc.contributor.orcidimecLoo, Roger::0000-0003-3513-6058
dc.contributor.orcidimecHikavyy, Andriy::0000-0002-8201-075X
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.source.peerreviewno
dc.source.conferenceE-MRS Fall Symposium: Alternative Semiconductor Integration in Si Microelectronics: Materials, Techniques and Applications
dc.source.conferencedate15/09/2015
dc.source.conferencelocationWarsaw Poland
imec.availabilityPublished - imec


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