Selective etch of Si and SiGe for gate-all-around device architecture

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Authors
Wostyn, Kurt; Sebaai, Farid; Rip, Jens; Mertens, Hans; Witters, Liesbeth; Loo, Roger; Hikavyy, Andriy; Milenin, Alexey; Horiguchi, Naoto; Collaert, Nadine; Thean, Aaron; Mertens, Paul; De Gendt, Stefan; Holsteyns, Frank
DOI
10.1149/06908.0147ecst
Conference
Semiconductor Cleaning Science and Technology 14 - SCST 14
Title
Selective etch of Si and SiGe for gate-all-around device architecture
Publication type
Proceedings paper
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