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Selective etch of Si and SiGe for gate-all-around device architecture

dc.contributor.authorWostyn, Kurt
dc.contributor.authorSebaai, Farid
dc.contributor.authorRip, Jens
dc.contributor.authorMertens, Hans
dc.contributor.authorWitters, Liesbeth
dc.contributor.authorLoo, Roger
dc.contributor.authorHikavyy, Andriy
dc.contributor.authorMilenin, Alexey
dc.contributor.authorHoriguchi, Naoto
dc.contributor.authorCollaert, Nadine
dc.contributor.authorThean, Aaron
dc.contributor.authorMertens, Paul
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorHolsteyns, Frank
dc.date.accessioned2021-10-23T01:05:59Z
dc.date.available2021-10-23T01:05:59Z
dc.date.issued2015-10
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/26186
dc.sourceIIOimport
dc.titleSelective etch of Si and SiGe for gate-all-around device architecture
dc.typeProceedings paper
dc.contributor.imecauthorWostyn, Kurt
dc.contributor.imecauthorSebaai, Farid
dc.contributor.imecauthorRip, Jens
dc.contributor.imecauthorMertens, Hans
dc.contributor.imecauthorWitters, Liesbeth
dc.contributor.imecauthorLoo, Roger
dc.contributor.imecauthorHikavyy, Andriy
dc.contributor.imecauthorMilenin, Alexey
dc.contributor.imecauthorHoriguchi, Naoto
dc.contributor.imecauthorCollaert, Nadine
dc.contributor.imecauthorThean, Aaron
dc.contributor.imecauthorMertens, Paul
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorHolsteyns, Frank
dc.contributor.orcidimecWostyn, Kurt::0000-0003-3995-0292
dc.contributor.orcidimecLoo, Roger::0000-0003-3513-6058
dc.contributor.orcidimecHikavyy, Andriy::0000-0002-8201-075X
dc.contributor.orcidimecMilenin, Alexey::0000-0003-0747-0462
dc.contributor.orcidimecHoriguchi, Naoto::0000-0001-5490-0416
dc.contributor.orcidimecCollaert, Nadine::0000-0002-8062-3165
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.identifier.doi10.1149/06908.0147ecst
dc.source.peerreviewyes
dc.source.beginpage147
dc.source.endpage152
dc.source.conferenceSemiconductor Cleaning Science and Technology 14 - SCST 14
dc.source.conferencedate11/10/2015
dc.source.conferencelocationPhoenix, AZ USA
imec.availabilityPublished - imec
imec.internalnotesECS Transactions; Vol. 69, Issue 8


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